The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1992
Filed:
Oct. 23, 1991
Guenter Braeuer, Freigericht, DE;
Eberhard Schultheiss, Herborn, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
In a sputtering cathode arrangement according to the magnetron principle for the coating of a flat circular substrate, with a circular ring-shaped target and an outer mask and inner mask disposed between the target and the substrate, a magnet system with a yoke plate being disposed in back of the target for the production of the magnetron effect, the inner mask is fastened to a mask holder which is brought through the center of the target, the magnet system with the yoke plate (8) being disposed for rotation about an axis of rotation (M) going through the center of the target, and consisting of at least two magnet arrangements (9,9', . . . ; 10,10', . . . ) off-center from the axis of rotation, each of which produces a self-contained tunnel of magnetic lines of force, each tunnel lying outside of the axis of rotation (M), and the eccentric dispositions of the two magnet arrangements with respect to the axis of rotation (M) being so chosen that the sum of the rate contributions of all target portions within magnetic lines of force from magnetrons and deposited on the substrate is very uniform across the radius within the circular coating surface.