Company Filing History:
Years Active: 2016-2025
Title: Innovations of Dzmitry Hrunski
Introduction
Dzmitry Hrunski is a notable inventor based in Aschaffenburg, Germany. He has made significant contributions to the field of sputtering technology, with a focus on diaphragm assemblies and plasma generation. His innovative work has led to the development of two patents that enhance the efficiency and functionality of sputtering devices.
Latest Patents
Hrunski's latest patents include a diaphragm assembly for delimiting the coating region of a sputter source and a sputtering device. The diaphragm assembly is designed to be temporally and geometrically variable in situ, allowing for improved control during the deposition of layers. This invention features a main part with a passage delimited by a passage edge, and it incorporates a diaphragm plate that can be moved in front of the passage. Additionally, the assembly includes a movement device that facilitates this movement.
His second patent involves an RF electrode for generating plasma in a plasma chamber, which includes an optical feedthrough. This plasma chamber is equipped with a substrate support and allows for in situ analysis or processing of layers or plasma. The method described in this patent enables the supply of electromagnetic radiation through the optical feedthrough for analysis or processing purposes.
Career Highlights
Throughout his career, Hrunski has worked with prominent organizations such as Forschungszentrum Juelich GmbH and Solayer GmbH. His experience in these companies has contributed to his expertise in the field of plasma technology and sputtering devices.
Collaborations
Hrunski has collaborated with notable professionals in his field, including Stefan Muthmann and Aad Gordijn. These collaborations have likely enriched his work and led to further advancements in his inventions.
Conclusion
Dzmitry Hrunski's contributions to sputtering technology and plasma generation are noteworthy. His innovative patents reflect his commitment to advancing the field and improving the efficiency of sputtering devices. His work continues to influence the industry and inspire future innovations.