The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Jul. 07, 2011
Stefan Muthmann, Aachen, DE;
Aad Gordijn, Juelich, DE;
Reinhard Carius, Juelich, DE;
Markus Huelsbeck, Juelich, DE;
Dzmitry Hrunski, Aschaffenburg, DE;
Stefan Muthmann, Aachen, DE;
Aad Gordijn, Juelich, DE;
Reinhard Carius, Juelich, DE;
Markus Huelsbeck, Juelich, DE;
Dzmitry Hrunski, Aschaffenburg, DE;
Forschungszentrum Juelich GmbH, Juelich, DE;
Abstract
A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode with a substrate support for holding a substrate, wherein a high-frequency alternating field for generating the plasma can be formed between the RF electrode and the counter-electrode. The chamber comprising an RF electrode with an optical feedthrough. A method, for in situ analysis or in situ processing of a layer or plasma in a plasma chamber, wherein the layer is disposed on counter-electrode and an RF electrode is disposed on the side lacing the layer. Selection of an RF electrode having an optical feedthrough, and at least one step in which electromagnetic radiation is supplied through the optical feedthrough for purposes of analysis or processing of the layer or the plasma, and by at least one other step in which the scattered or emitted or reflected radiation is supplied to an analysis unit.