Aachen, Germany

Stefan Muthmann

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Forschungszentrum Juelich Gmbh. Active years: 2016.


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations of Stefan Muthmann in Plasma Technology

Introduction

Stefan Muthmann is a notable inventor based in Aachen, Germany. He has made significant contributions to the field of plasma technology, particularly through his innovative patents. His work focuses on the development of electrodes for plasma generation and analysis.

Latest Patents

Stefan Muthmann holds a patent titled "Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ." This invention involves a radio frequency (RF) electrode designed to generate plasma within a plasma chamber. The chamber includes an RF electrode and a counter-electrode, which together create a high-frequency alternating field for plasma generation. The design also features an optical feedthrough that allows for in situ analysis or processing of layers or plasma, enhancing the capabilities of plasma technology.

Career Highlights

Throughout his career, Stefan Muthmann has worked with prominent research institutions, including Forschungszentrum Jülich GmbH. His experience in these organizations has allowed him to refine his expertise in plasma technology and contribute to various innovative projects.

Collaborations

Stefan has collaborated with notable colleagues such as Aad Gordijn and Markus Huelsbeck. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of plasma research.

Conclusion

Stefan Muthmann's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the field, paving the way for future advancements in plasma applications.

Profile summary based on public USPTO records.
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