Netanya, Israel

Dudi Vakrat

This inventor holds 10 USPTO granted patents and 2 published patent applications. Top assignees: Zoran Corporation, Csr Technology Inc., Qualcomm Technologies, Inc.. Active years: 2011-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dudi Vakrat. Retrieved from https://idiyas.com/inventor/dudi-vakrat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 70.0

Average Co-Inventor Count = 1.8

ph-index = 4

Forward Citations = 28(Granted Patents)


Location History:

  • Kiryat Hasharon, IL (2011)
  • Iyar, IL (2012)
  • Nethanya, IL (2011 - 2014)
  • Netanya, IL (2013 - 2015)

Company Filing History:


Years Active: 2011-2015

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10 patents (USPTO):Explore Patents

Title: Inventor Dudi Vakrat - Revolutionizing Technology in Nethanya, IL

Introduction: Dudi Vakrat is a visionary inventor based in Nethanya, Israel, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Dudi Vakrat holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his commitment to pushing the boundaries of what is possible in the modern world.

Career Highlights: With a career spanning over two decades, Dudi Vakrat has worked with leading tech companies and research institutions to develop cutting-edge solutions that have the potential to revolutionize industries and improve the quality of life for people around the globe.

Collaborations: Throughout his career, Dudi Vakrat has collaborated with top engineers, scientists, and researchers to bring his innovative ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Dudi Vakrat's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His work continues to inspire the next generation of inventors and shape the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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