This inventor holds 7 USPTO granted patents and 1 EPO patent. Top assignees: Harvard College, Ultratech, Inc., Cambridge Nanotech, Inc.. Active years: 2007-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Cambridge, MA (US) (2007 - 2012)
- Amsterdam, NL (2015 - 2017)
Company Filing History:


Years Active: 2007-2017
Title: Douwe Johannes Monsma: Innovator in Vapor Deposition Technologies
Introduction
Douwe Johannes Monsma is a notable inventor based in Cambridge, MA (US). He holds a total of 7 patents that showcase his contributions to the field of vapor deposition systems and methods. His innovative work has significantly advanced the technology used in thin film deposition processes.
Latest Patents
Monsma's latest patents include "Vapor deposition systems and methods," which provide systems designed to promote high-quality deposition while simplifying manufacture, modification, and use. These systems also aim to reduce the footprint, offering various advantages. Another significant patent is "System and method for thin film deposition," which describes a reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates. This assembly includes a reaction chamber and an input plenum that delivers a uniform flow of source material across the substrate support width. The design ensures that the outflow material is uniformly removed and compressed, resulting in a consistent source material flow over the substrates. This configuration effectively reduces pump down times, enhancing the efficiency of the deposition process.
Career Highlights
Monsma has worked with prestigious institutions such as Harvard College and Ultratech, Inc. His experience in these organizations has contributed to his expertise in vapor deposition technologies and has allowed him to develop innovative solutions in this field.
Collaborations
Throughout his career, Monsma has collaborated with talented individuals, including Jill Svenja Becker and Sergio Osvaldo Valenzuela. These collaborations have likely enriched his work and contributed to the advancements in his patented technologies.
Conclusion
Douwe Johannes Monsma's contributions to vapor deposition technologies through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile