The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2012

Filed:

Jun. 27, 2005
Applicants:

Douwe J. Monsma, Cambridge, MA (US);

Jill S. Becker, Cambridge, MA (US);

Inventors:

Douwe J. Monsma, Cambridge, MA (US);

Jill S. Becker, Cambridge, MA (US);

Assignee:

Cambridge NanoTech, Inc., Cambridge, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
Abstract

Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst other advantages.

Published as:
US2006021573A1; WO2007001301A2; EP1771598A2; KR20070048177A; WO2007001301A3; JP2008504447A; EP1771598B1; ATE444380T1; DE602005016933D1; EP2161352A1; CN101684550A; US2012070581A1; CN101684550B; US8202575B2; JP5179179B2; EP2161352B1; US9556519B2; US2017159177A1;

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