Douglas Perry

Title: Douglas Perry: Innovator in Semiconductor Technology

Introduction

Douglas Perry is a notable inventor based in Chelsea, MI (US), recognized for his contributions to semiconductor technology. With a total of three patents to his name, Perry has made significant advancements in the field of real-time temperature measurement for semiconductor substrates.

Latest Patents

One of Perry's latest patents is an apparatus and method for real-time measurement of substrate temperatures for use in semiconductor growth and wafer processing. This invention employs an optical method and apparatus to measure the temperature of semiconductor substrates during thin film growth and wafer processing. By utilizing the nearly linear dependence of the interband optical absorption edge on temperature, this method allows for highly accurate measurement of the absorption edge in both diffuse reflectance and transmission geometry. The apparatus is designed to operate across a wide range of temperatures, covering all necessary ranges for common semiconductor substrates, enabling closed-loop temperature control during film growth and processing.

Career Highlights

Douglas Perry is currently associated with K-Space Associates, Inc., where he continues to innovate in the semiconductor industry. His work has been instrumental in enhancing the precision of temperature measurements, which is crucial for the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Perry has collaborated with notable colleagues such as Charles A. Taylor, II and Darryl Barlett, contributing to a dynamic work environment that fosters innovation and technological advancement.

Conclusion

Douglas Perry's work in semiconductor technology exemplifies the impact of innovative thinking on industry practices. His patents reflect a commitment to improving measurement techniques, which are essential for the advancement of semiconductor manufacturing.