Nampa, ID, United States of America

Doug Uzzel

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Sms Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Doug Uzzel. Retrieved from https://idiyas.com/inventor/doug-uzzel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Doug Uzzel - Innovator in Photomask Analysis

Introduction

Doug Uzzel is a notable inventor based in Nampa, Idaho. He has made significant contributions to the field of photomask analysis, showcasing his expertise through his innovative patent.

Latest Patents

Doug Uzzel holds a patent titled "Method for Analyzing a Photomask." This method involves the determination of a Bossung plot, which is crucial for the evaluation and improvement of photomask quality in semiconductor manufacturing. His work in this area has the potential to enhance the precision and efficiency of photomask production.

Career Highlights

Doug is currently employed at Carl Zeiss SMS Ltd., a company renowned for its advanced optical systems and solutions. His role at the company allows him to apply his innovative ideas and contribute to cutting-edge technologies in the industry. With 1 patent to his name, Doug has established himself as a valuable asset in the field of photomask analysis.

Collaborations

Doug has collaborated with talented individuals such as Vahagn Sargsyan and Gilles Tabbone. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Doug Uzzel's contributions to photomask analysis exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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