Doris Chin

Title: Doris Chin: Innovator in Optical Metrology

Introduction

Doris Chin is a prominent inventor based in Milpitas, CA (US). She has made significant contributions to the field of optical metrology, particularly in the area of semiconductor wafer analysis. Her innovative approach has led to the development of a unique patent that enhances the accuracy of profile modeling in optical measurements.

Latest Patents

Doris Chin holds a patent titled "Selecting a hypothetical profile to use in optical metrology." This patent involves using a hypothetical profile to model the structure of a semiconductor wafer. The process includes obtaining sample diffraction signals from measured diffraction signals of structures formed on the wafer. By defining and evaluating a hypothetical profile using these sample diffraction signals, Doris has improved the determination of the profile of structures through optical metrology. She has 1 patent to her name.

Career Highlights

Doris is currently employed at Timbre Technologies, Inc., where she continues to push the boundaries of innovation in her field. Her work has been instrumental in advancing optical metrology techniques, making her a valuable asset to her company and the industry at large.

Collaborations

Doris collaborates with talented individuals such as Vi Vuong and Junwei Bao, contributing to a dynamic team environment that fosters innovation and creativity.

Conclusion

Doris Chin's contributions to optical metrology exemplify her dedication to innovation and excellence. Her patent and work at Timbre Technologies, Inc. highlight her role as a leading inventor in the field.