Suwon-si, South Korea

Donggyu Heo

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovations of Donggyu Heo

Introduction

Donggyu Heo is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to the field of semiconductor technology. His innovative work has led to the development of advanced semiconductor memory devices.

Latest Patents

Donggyu Heo holds a patent for a "Semiconductor memory device including work function adjusting layer in buried gate line and method of manufacturing the same." This patent discloses a semiconductor memory device that includes a device isolation layer defining active regions of a substrate, and gate lines buried in the substrate and extending across the active regions. Each of the gate lines comprises a conductive layer, a liner layer separating the conductive layer and the substrate, and a first work function adjusting layer. The first work function adjusting layer includes a first work function adjusting material, with its work function being less than those of the conductive layer and the liner layer. He has 1 patent to his name.

Career Highlights

Donggyu Heo is associated with Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has significantly impacted the development of semiconductor technologies.

Collaborations

He has collaborated with notable coworkers, including Namho Jeon and Jin-Seong Lee, contributing to various projects within the company.

Conclusion

Donggyu Heo's innovative work in semiconductor technology exemplifies the advancements being made in the field. His contributions continue to influence the development of memory devices, showcasing the importance of innovation in technology.

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