The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Apr. 30, 2018
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Namho Jeon, Hwaseong-si, KR;

Jin-Seong Lee, Gyeonggi-do, KR;

Hyun-jung Lee, Seongnam-si, KR;

Dongsoo Woo, Seoul, KR;

Donggyu Heo, Suwon-si, KR;

Jaeho Hong, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/105 (2006.01); H01L 29/06 (2006.01); H01L 21/8238 (2006.01); H01L 21/8239 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1052 (2013.01); H01L 21/8239 (2013.01); H01L 21/823842 (2013.01); H01L 27/10814 (2013.01); H01L 27/10817 (2013.01); H01L 27/10823 (2013.01); H01L 27/10855 (2013.01); H01L 27/10876 (2013.01); H01L 27/10885 (2013.01); H01L 27/10888 (2013.01); H01L 27/10891 (2013.01); H01L 27/10894 (2013.01); H01L 27/10897 (2013.01); H01L 29/0649 (2013.01);
Abstract

Disclosed are a semiconductor memory device and a method of manufacturing the same. The semiconductor memory device includes a device isolation layer defining active regions of a substrate, and gate lines buried in the substrate and extending across the active regions. Each of the gate lines includes a conductive layer, a liner layer disposed between and separating the conductive layer and the substrate, and a first work function adjusting layer disposed on the conductive layer and the liner layer. The first work function adjusting layer includes a first work function adjusting material. A work function of the first work function adjusting layer is less than those of the conductive layer and the liner layer.


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