Location History:
- Ami-ri, Bubal-eub, Ichon-kun, Kyoungki-do, KR (1995)
- Gyeonggi-do, KR (2006)
- Icheon, KR (2007)
- Icheon-si, KR (2007 - 2008)
Company Filing History:
3 out of 836 
1 out of 854 
1 out of 832,718 Years Active: 1995-2008
Title: Dong Yeal Keum: Innovator in Semiconductor Technology
Introduction
Dong Yeal Keum is a prominent inventor based in Icheon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have paved the way for advancements in semiconductor device fabrication.
Latest Patents
One of his latest patents is titled "Method for fabricating silicide layers for semiconductor device." This patent discloses a method that includes forming a first barrier pattern to cover a specific region of a semiconductor substrate while exposing other regions. The process involves creating oxide layer patterns and selectively forming silicide on designated regions through an annealing process. Another notable patent is "Capacitor and method for fabricating the same." This invention describes a capacitor structure where the lower and upper electrodes are separated by a predetermined interval, enhancing the effective surface area within a limited space.
Career Highlights
Throughout his career, Dong Yeal Keum has worked with notable companies, including Dongbu Electronics, Co. Ltd. His expertise in semiconductor technology has been instrumental in developing innovative solutions that address industry challenges.
Collaborations
Dong Yeal Keum has collaborated with esteemed colleagues such as Chang Hun Han and Cheol Soo Park. Their combined efforts have contributed to the advancement of semiconductor technologies and innovations.
Conclusion
Dong Yeal Keum's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices.