Fremont, CA, United States of America

Dong Wu


Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2022

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3 patents (USPTO):

Title: The Innovative Journey of Inventor Dong Wu

Introduction

Dong Wu, an accomplished inventor based in Fremont, California, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of three patents, Wu's innovative processes have the potential to revolutionize semiconductor device fabrication, reflecting his expertise and dedication to advancing technology.

Latest Patents

Wu's latest contributions to the industry include patents for a semiconductor device fabrication process titled "Gate Contact Over Active Regions." This intricate process involves forming gates on a substrate that features a multitude of openings. Each gate consists of a conducting layer made from a first metal and a gate dielectric layer composed of a first dielectric material. The process also entails partially filling the openings with a second dielectric material. A notable aspect of this invention is the formation of a first structure within a processing system while maintaining vacuum integrity. Additionally, it includes the deposition of a third dielectric material over the first structure and the creation of a planarized surface that ensures compatibility with the existing gates. The first structure's formation necessitates the creation of trenches through the removal of specific portions of the second dielectric material, along with the crafting of recessed active regions and metal cap layers that enhance device performance.

Career Highlights

Dong Wu is currently making significant contributions at Applied Materials, Inc. His role within the organization has allowed him to develop and refine his patentable technologies, making a lasting impact in the semiconductor industry. Throughout his career, Wu has demonstrated a commitment to pushing the boundaries of innovation, which is evident in the complexity and utility of his patents.

Collaborations

Throughout his journey as an inventor, Wu has collaborated with talented colleagues, including Gaurav Thareja and Keyvan Kashefizadeh. These collaborations have fostered an environment of shared knowledge and expertise, further advancing their collective work in semiconductor technology.

Conclusion

Dong Wu's inventive spirit and dedication to innovation have set him apart as a key contributor in the field of semiconductor fabrication. His latest patents showcase a profound understanding of the complexities involved in developing advanced technologies. With his continued work at Applied Materials, Inc. and collaborations with esteemed coworkers, the future looks promising for his contributions to the industry. As technology evolves, inventors like Wu play a crucial role in shaping the trajectory of innovation.

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