Dong Sik Park

Title: Dong Sik Park: Innovator in Semiconductor Technology

Introduction

Dong Sik Park is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents is a semiconductor memory device with buried contacts and a fence. This invention provides an improved semiconductor memory device that includes a substrate, a gate electrode extending in a first direction, a plurality of buried contacts, and a fence positioned in a trench between adjacent buried contacts. The design aims to enhance element performance and reliability. Another notable patent is for a semiconductor device with a bit-line structure over a cell region isolation film. This device comprises a substrate with a cell region, a cell region isolation film, and a bit-line structure that has a distal end positioned on the cell region isolation film. The innovative design includes various components such as a cell spacer and an interlayer insulating film made of silicon nitride.

Career Highlights

Dong Sik Park has worked with leading organizations in the industry, including Samsung Electronics and the Ajou University Industry-Academic Cooperation Foundation. His experience in these companies has allowed him to develop and refine his expertise in semiconductor technology.

Collaborations

Throughout his career, Dong Sik Park has collaborated with notable colleagues such as Bun Yeoul Lee and Jong Yeob Jeon. These collaborations have contributed to the advancement of semiconductor innovations.

Conclusion

Dong Sik Park is a distinguished inventor whose work in semiconductor technology has led to several important patents. His contributions continue to influence the field and enhance the performance of semiconductor devices.