Dong-Lung Lee

Title: Dong-Lung Lee: Innovator in Integrated Circuit Technology

Introduction

Dong-Lung Lee is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of integrated circuit (IC) technology, holding a total of 2 patents. His work focuses on improving the efficiency and functionality of semiconductor devices.

Latest Patents

One of Dong-Lung Lee's latest patents is titled "Diffusion region routing for narrow scribe-line devices." This patent outlines a method for creating an integrated circuit device. The process involves forming a first and second IC feature in a semiconductor substrate, which are spaced apart and separated by a scribe region. A doped routing feature is formed within the scribe region to connect these IC features. Additionally, a multilayer interconnect (MLI) structure and an interlayer dielectric (ILD) are created on the substrate, with the MLI being absent in the scribe region. The method concludes with etching the ILD and substrate to form a scribe-line trench.

Career Highlights

Dong-Lung Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in IC design and manufacturing has positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Dong-Lung Lee has collaborated with notable colleagues, including Ming-Chang Hsieh and Hung-Lin Chen. These partnerships have contributed to the advancement of technology in the semiconductor field.

Conclusion

Dong-Lung Lee's innovative work in integrated circuit technology and his contributions to Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the field. His patents reflect a commitment to enhancing semiconductor device performance and efficiency.