Dong-Jin Byun

Title: Discovering the Innovations of Inventor Dong-Jin Byun

Introduction

Dong-Jin Byun, an accomplished inventor based in Seoul, South Korea, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, his work focuses on innovative methods that enhance the efficiency of electronic devices.

Latest Patents

One of Dong-Jin Byun's latest patents is a "Method for Removing Photoresist Pattern." This patent discloses a technique that involves radiating light onto a substrate that has a photoresist pattern and is implanted with a predetermined dopant. The method is designed to increase the substrate's temperature to a level sufficient for the complete removal of the photoresist pattern using a straightforward light radiation process. This innovation simplifies the removal process while ensuring thorough results.

Another notable patent is the "Method of Forming Nitride Semiconductor and Electronic Device Comprising the Same." In this invention, Byun presents a method for forming a nitride semiconductor through ion implantation. An ion implantation region characterized by a line/space pattern is established on a substrate using a specified ion implantation dose and energy. This process is followed by the growth of a metal nitride thin film via epitaxial lateral overgrowth, resulting in reduced lattice defects. Consequently, the electronic device developed through this method exhibits improved efficiency.

Career Highlights

Dong-Jin Byun has been associated with prominent institutions, notably the Korea University Industrial and Academic Collaboration Foundation and the Korea University Research and Business Foundation. His tenure at these organizations has played a crucial role in advancing his research and development efforts in semiconductor technologies.

Collaborations

Throughout his career, Byun has collaborated with several esteemed professionals in the field, including colleagues Bum-Joon Kim and Jung-Geun Jhin. Their collective efforts have contributed significantly to the innovation landscape, particularly in the development of advanced semiconductor solutions.

Conclusion

Dong-Jin Byun's innovative spirit and dedication to advancing semiconductor technology highlight his status as a noteworthy inventor. With his patents focusing on efficient methods for semiconductor fabrication and pattern removal, he continues to make a lasting impact in the electronics industry. His contributions not only enhance device performance but also pave the way for future technological advancements.