The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Feb. 10, 2011
Dong-jin Byun, Seoul, KR;
Sam-seok Jang, Seoul, KR;
Bum-joon Kim, Seoul, KR;
Jung-geun Jhin, Gwangju, KR;
Sang-il Kim, Seoul, KR;
Do-han Lee, Seoul, KR;
Dong-Jin Byun, Seoul, KR;
Sam-Seok Jang, Seoul, KR;
Bum-Joon Kim, Seoul, KR;
Jung-Geun Jhin, Gwangju, KR;
Sang-Il Kim, Seoul, KR;
Do-Han Lee, Seoul, KR;
Abstract
Disclosed is a method of removing a photoresist pattern, which includes radiating light onto a substrate having a photoresist pattern formed thereon and implanted with a predetermined dopant so that the temperature of the substrate is increased to be equal to or higher than a temperature able to remove the photoresist pattern, and by which the photoresist pattern formed on the substrate can be almost completely removed using a simple process for radiating light onto the substrate so that the temperature of the substrate is increased to be equal to or higher than a temperature able to the photoresist pattern.