Dong Hoon Khang

Title: Innovations of Dong Hoon Khang

Introduction

Dong Hoon Khang is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, Khang has demonstrated his expertise and innovative spirit in the industry.

Latest Patents

Khang's latest patents focus on methods of fabricating semiconductor devices. The first patent describes a method that includes forming mask patterns on a substrate, which consist of a first mask fin pattern, a second mask fin pattern, and a dummy mask pattern. This method involves etching the substrate using these mask patterns to create a first fin pattern, a second fin pattern, and a dummy fin pattern. The dummy fin pattern is then removed, with the dummy mask pattern being wider than the first and second mask fin patterns. The second patent presents a similar method, emphasizing the importance of precision in semiconductor fabrication.

Career Highlights

Dong Hoon Khang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. Khang's contributions have been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Khang has collaborated with talented coworkers such as Sug Hyun Sung and Min Hwan Jeon. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Dong Hoon Khang is a prominent inventor whose work in semiconductor technology has led to significant advancements in the field. His patents reflect his commitment to innovation and excellence in the industry.