Whasung, South Korea

Dong Hee Yu


Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2011-2012

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: The Innovations of Dong Hee Yu

Introduction

Dong Hee Yu is a prominent inventor based in Whasung, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Dong Hee Yu's latest patents include innovative methods that address critical challenges in semiconductor fabrication. One of his patents, titled "Semiconductor inter-field dose correction," presents a method and apparatus for adapting a semiconductor inter-field dose correction map from a first photolithography mask to a second photolithography mask. This method involves obtaining a first dose correction map based on chip identities, determining transformation matrices, and transforming the dose correction map accordingly. Another notable patent is "Transistor formation using capping layer," which outlines a method for forming transistors in complementary metal-oxide semiconductor (CMOS) structures. This method includes depositing a conductive layer, applying a capping layer, and ion-implanting transistors to effectively dope their source and drain regions.

Career Highlights

Throughout his career, Dong Hee Yu has worked with leading technology companies, including Samsung Electronics Co., Ltd. and IBM. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Dong Hee Yu has collaborated with notable professionals in the field, including Hyung-Rae Lee and Len Yuan Tsou. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Dong Hee Yu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.

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