Company Filing History:
Years Active: 2016-2018
Title: Dong Geun Shin: Innovator in Silicon Carbide Technology
Introduction
Dong Geun Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the fabrication of silicon carbide powder. With a total of 7 patents to his name, Shin's work has implications for various industrial applications.
Latest Patents
Shin's latest patents include innovative methods for fabricating silicon carbide powder. One method involves preparing a silicon carbide molded member by molding a silicon carbide material, followed by pulverizing this member to create a silicon carbide agglomerate. The final step in this process is heat-treating the agglomerate to produce the desired silicon carbide powder. Another embodiment of his work focuses on using a primary material with a specific grain size and a secondary material that is agglomerated, ultimately leading to the production of silicon carbide powder through heat treatment. Additionally, he has developed a silicon carbide powder that includes nitrogen at concentrations ranging from about 100 ppm to about 5000 ppm, which enhances its properties.
Career Highlights
Throughout his career, Dong Geun Shin has worked with notable organizations such as LG Innotek Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to advance his research and contribute to the development of innovative materials.
Collaborations
Shin has collaborated with esteemed colleagues, including Jung Eun Han and Byung Sook Kim. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in the field of materials science.
Conclusion
Dong Geun Shin's contributions to the field of silicon carbide technology highlight his innovative spirit and dedication to advancing materials science. His patents and collaborations reflect a commitment to excellence and a drive to push the boundaries of what is possible in this important area of research.