This inventor holds 4 USPTO granted patents and 2 published patent applications and 3 EPO patents. Top assignee: Korea Basic Science Institute. Active years: 2015-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Daejeon-si, KR (2015)
- Daejeon, KR (2018 - 2019)
Company Filing History:
Years Active: 2015-2019
Title: Innovations of Dong Chan Seok in Plasma Processing Technology.
Introduction
Dong Chan Seok is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on developing advanced equipment for treating powders using plasma technology.
Latest Patents
One of his latest patents is a powder plasma processing apparatus designed to enhance the efficiency of powder treatment. This apparatus features a circular surface discharge plasma module that includes a plate-like electrode layer, an insulating layer, and a plasma generating electrode. The design allows for the rotation of the module, where an alternating voltage is applied to generate plasma around the electrode. This innovative approach enables effective processing of powders within the module. Another notable patent involves a chamber specifically configured for plasma processing of powders. It includes a powder supply unit and multiple plate-like surface discharge plasma modules, which are strategically positioned to ensure uniform processing of the powder. This design allows for better control over the time the powder interacts with the plasma, leading to more efficient processing outcomes.
Career Highlights
Dong Chan Seok is affiliated with the Korea Basic Science Institute, where he continues to advance his research in plasma technology. His work has garnered attention for its potential applications in various industries, particularly in materials science and engineering.
Collaborations
He collaborates with notable colleagues such as Hyun Young Jeong and Yong Ho Jung, contributing to a dynamic research environment that fosters innovation and development in plasma processing technologies.
Conclusion
Dong Chan Seok's contributions to plasma processing technology exemplify the impact of innovative thinking in scientific research. His patents reflect a commitment to enhancing the efficiency of powder treatment processes, showcasing the potential of plasma technology in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile