The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Sep. 28, 2017
Applicant:

Korea Basic Science Institute, Daejeon, KR;

Inventors:

Dong Chan Seok, Daejeon, KR;

Yong Ho Jung, Seoul, KR;

Hyun Young Jeong, Gunsan-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); H01J 37/32 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32532 (2013.01); B01J 19/088 (2013.01); H01J 37/32009 (2013.01); H01J 37/32348 (2013.01); H01J 37/32568 (2013.01); H05H 1/2406 (2013.01); B01J 2219/083 (2013.01); B01J 2219/0879 (2013.01); H05H 2001/2412 (2013.01); H05H 2001/2431 (2013.01);
Abstract

A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the circular surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the circular surface discharge plasma module.


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