Milton, VT, United States of America

Donald Walter Rakowski


Average Co-Inventor Count = 5.8

ph-index = 6

Forward Citations = 96(Granted Patents)


Location History:

  • Georgia, VT (US) (1996)
  • Milton, VT (US) (2001 - 2005)

Company Filing History:


Years Active: 1996-2005

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7 patents (USPTO):

Title: The Innovative Mind of Donald Walter Rakowski

Introduction

Donald Walter Rakowski, based in Milton, Vermont, is a prolific inventor known for his significant contributions to the field of semiconductor technology. With a total of seven patents to his name, Rakowski’s work primarily focuses on methods and apparatuses that enhance ion implantation processes, vital in semiconductor manufacturing.

Latest Patents

Rakowski’s latest patents reflect his innovative approach to both disposable and permanent films used in semiconductor doping. One notable patent is the "Methods using disposable and permanent films for diffusion and implantation doping." This invention outlines methods that utilize these films to dope underlying layers effectively through diffusion while preventing damage to the silicon materials below. Moreover, his patent also emphasizes the importance of performing deep implantations to form source/drain regions, followed by an anneal step to activate the dopants, ensuring precision in semiconductor device fabrication.

Another key patent is the "Ion implanter in-situ mass spectrometer," which introduces an apparatus for the in-situ detection of ions in ion implanter devices. This inventive mass spectrometer generates a magnetic field to guide desirable ions while detecting undesirable ions to ensure the quality of the implanted semiconductor. This real-time data collection capability enhances the overall efficiency and cleanliness of the manufacturing process.

Career Highlights

Rakowski currently works at International Business Machines Corporation (IBM), where he has played a pivotal role in advancing semiconductor technologies. His extensive experience and innovative strategies contribute to IBM's standing as a leader in the tech industry.

Collaborations

Throughout his career, Rakowski has collaborated with esteemed colleagues, including Toshiharu Furukawa and Mark Charles Hakey. These partnerships have fostered an environment of innovation, allowing for complex problems to be tackled collectively, thereby enhancing the research and development efforts at IBM.

Conclusion

Donald Walter Rakowski exemplifies the spirit of innovation, pushing the boundaries of semiconductor technology through his patents and collaborative efforts. His work not only enhances existing technologies within IBM but also sets a foundation for future advancements in the field. As the semiconductor industry continues to evolve, inventors like Rakowski will be at the forefront, driving significant changes that impact technology globally.

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