Farmington, CT, United States of America

Donald S Battistoni

This inventor holds 1 USPTO granted patent. Top assignee: Zygo Corporation. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donald S Battistoni. Retrieved from https://idiyas.com/inventor/donald-s-battistoni

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovations of Donald S Battistoni

Introduction

Donald S Battistoni is a notable inventor based in Farmington, CT (US). He has made significant contributions to the field of optics and interferometry. His work focuses on improving measurement accuracy in various applications.

Latest Patents

Donald S Battistoni holds a patent for a "Method for calibration and removal of wavefront errors." This patent describes an apparatus and methods for generating an empirically determined mathematical model of wavefront error in an interferometer. The model accounts for aperture misalignment and is applied to correct subsequent measurements. The methods are particularly useful in Fizeau and other types of interferometers, where carrier fringe analysis can reduce errors caused by environmental and vibration effects. He has 1 patent to his name.

Career Highlights

Battistoni is associated with Zygo Corporation, a company known for its advanced optical systems and measurement solutions. His work at Zygo has allowed him to contribute to cutting-edge technologies in the field of optics.

Collaborations

One of his notable coworkers is Robert Smythe, with whom he has likely collaborated on various projects within the company.

Conclusion

Donald S Battistoni's innovative work in wavefront error calibration has made a significant impact in the field of interferometry. His contributions continue to enhance measurement accuracy in optical systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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