Silverthorne, CO, United States of America

Donald J Samuels


Average Co-Inventor Count = 2.3

ph-index = 9

Forward Citations = 602(Granted Patents)


Location History:

  • Yorktown, NY (US) (1996 - 1999)
  • Yorktown Heights, NY (US) (1994 - 2001)
  • Silverthorne, CO (US) (2001 - 2018)

Company Filing History:


Years Active: 1994-2018

where 'Filed Patents' based on already Granted Patents

19 patents (USPTO):

Title: **Innovations and Contributions of Donald J. Samuels**

Introduction

Donald J. Samuels, based in Silverthorne, CO, is an accomplished inventor with a significant portfolio comprising 19 patents. His inventive prowess is highlighted by his contributions to semiconductor fabrication processes and lithographic techniques, making him a notable figure in the field of innovative technologies.

Latest Patents

Among his latest patents is the "Method of simultaneous lithography and etch correction flow." This innovative method involves a computer-aided simulation where two independent process models — lithographic and etch — are co-optimized simultaneously. This approach ensures that the first mask size and second mask size align within a common process window, thereby enhancing the efficiency and accuracy of semiconductor manufacturing. Another prominent patent pertains to "Methods and systems to meet technology pattern density requirements of semiconductor fabrication processes." This technique optimizes pattern density fill patterns for integrated circuits by adjusting scribe line areas and dummy fill shapes while adhering to technology ground rules for die design.

Career Highlights

Donald has made significant strides in his career working for esteemed organizations such as the International Business Machines Corporation (IBM). His role in innovative projects and development of various technologies has established him as a leading expert in his field, helping advance the capabilities of semiconductor processes.

Collaborations

Throughout his career, Samuels has collaborated with notable colleagues, including Allen H. Gabor and William H. Advocate. These partnerships have fostered a rich exchange of ideas and further propelled advancements in the technological domain.

Conclusion

Donald J. Samuels exemplifies the spirit of innovation through his dedicated work in semiconductor technology and lithography. His patents and collaborations underscore the impact of his contributions, paving the way for future advancements in the industry.

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