The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Jun. 17, 1999
Donald J. Samuels, Silverthorne, CO (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A computer operated process ( ) for inspecting patterns ( ) on an object ( ) includes establishing different mismatch margins for different patterns ( ). A strict margin is associated with the pattern ( ) in a critical area ( ), and a relaxed margin is associated with the pattern ( ) in a non-critical area ( ). The inspection process ( ) rejects the object ( ) as being defective if a mismatch between a pattern ( ) and its respective master pattern ( ) exceeds a corresponding mismatch margin. Therefore, the inspection process ( ) maintains a high standard for the pattern ( ) in the critical area ( ) and eases the standard for the pattern ( ) in the non-critical area ( ).