Oberkochen, Germany

Dominik Schnoor

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dominik Schnoor. Retrieved from https://idiyas.com/inventor/dominik-schnoor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Dominik Schnoor: Innovator in Sample Processing Technology

Introduction

Dominik Schnoor is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of sample processing technology. His innovative approach has led to the development of a unique method that enhances the efficiency of sample processing.

Latest Patents

Dominik Schnoor holds a patent for a "Method and apparatus for processing a sample." This invention proposes a method for processing a sample with a processing arrangement, comprising specific steps that improve the overall processing efficiency. He has 1 patent to his name, showcasing his expertise in this area.

Career Highlights

Dominik is currently employed at Carl Zeiss SMT GmbH, a leading company in optical and industrial metrology. His work at this esteemed organization has allowed him to further develop his skills and contribute to cutting-edge technologies in the field.

Collaborations

Dominik collaborates with Julia Weber, a coworker who shares his passion for innovation and technology. Together, they work on projects that aim to push the boundaries of what is possible in sample processing.

Conclusion

Dominik Schnoor is a dedicated inventor whose work in sample processing technology has the potential to make a significant impact in various industries. His contributions reflect a commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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