Cheonan-si, South Korea

Dohyeon Yoon

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.5

ph-index = 1


Location History:

  • Cheonan-si, KR (2024)
  • Chungcheongnam-do, KR (2024)

Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: **Innovator Dohyeon Yoon: Pioneering Advances in Substrate Treatment**

Introduction

Dohyeon Yoon is an inventive mind based in Cheonan-si, South Korea. He is recognized for his contributions to substrate treatment technology, which plays a critical role in various industries, including electronics and materials science. His innovative work is encapsulated in a patent that addresses the efficient treatment of substrates.

Latest Patents

Dohyeon Yoon holds one notable patent titled "Apparatus and Method for Treating Substrate." This invention encompasses an apparatus designed for treating substrates by utilizing a specialized light treatment chamber. The chamber includes a support unit for holding substrates and an irradiation unit that emits light to eliminate organic matter present on those substrates. Notably, the irradiation unit features two distinct light sources: a first light source that emits first light and a second light source that provides second light, both operating at different wavelength ranges. This innovative approach enhances the efficiency of the substrate treatment process.

Career Highlights

Currently, Dohyeon Yoon is affiliated with Semes Co., Ltd., where he leverages his expertise in the field of substrate treatment technology. His role in the company allows him to be at the forefront of developing advanced solutions aimed at optimizing substrate preparation processes.

Collaborations

Throughout his career, Dohyeon Yoon has worked alongside esteemed colleagues, including Joo Jib Park and Jin Se Park. Their collaborative efforts contribute significantly to the advancements in substrate treatment technologies and the overall success of their projects at Semes Co., Ltd.

Conclusion

Dohyeon Yoon's contributions to the field of substrate treatment reflect his commitment to innovation and excellence. With a focus on improving the efficiency of substrate processing through inventive technologies, he continues to make strides in his field, paving the way for future advancements in various industries.

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