The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Jul. 08, 2021
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 7/00 (2006.01); B08B 7/04 (2006.01); F27B 17/00 (2006.01); F27D 5/00 (2006.01); H05B 1/02 (2006.01); H05B 3/30 (2006.01); H01L 21/687 (2006.01); H05B 3/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67028 (2013.01); B08B 7/0021 (2013.01); B08B 7/0071 (2013.01); B08B 7/04 (2013.01); F27B 17/0025 (2013.01); F27D 5/0037 (2013.01); H05B 1/0233 (2013.01); H05B 3/30 (2013.01); H01L 21/67103 (2013.01); H01L 21/6719 (2013.01); H01L 21/68742 (2013.01); H05B 3/283 (2013.01);
Abstract
The inventive concept provides an apparatus for treating a substrate by using a supercritical fluid. In an embodiment, the apparatus may include a process chamber that provides a treatment space, and including a chamber heater that increases a temperature of an interior of the treatment space, a substrate support provided in the treatment space and that supports the substrate, and a substrate heating member that heats a lower surface of the substrate while contacting the lower surface of the substrate.