Dmitri A Choutov

Title: Dmitri A Choutov: Innovator in Plasma Technology

Introduction

Dmitri A Choutov is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma technology, particularly in the area of low-energy electron enhanced etching. With a total of 8 patents to his name, Choutov's work has advanced the capabilities of substrate processing in various applications.

Latest Patents

One of his latest patents is titled "Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment." This invention describes an apparatus designed for low-damage, anisotropic etching of substrates. The substrate is mounted on a mechanical support located within an AC or DC plasma reactor. This mechanical support operates independently of the plasma reactor generating apparatus and is capable of being electrically biased. The substrate is subjected to a plasma of low-energy electrons and a species reactive with the substrate. Additionally, an extra structure that can be electrically biased may be placed within the plasma to further control the extraction or retardation of particles from the plasma.

Career Highlights

Throughout his career, Dmitri Choutov has worked with notable organizations such as Georgia Tech Research Corporation and Leybold Systems GmbH. His experience in these companies has allowed him to refine his expertise in plasma technology and etching processes.

Collaborations

Choutov has collaborated with several professionals in his field, including Kevin P Martin and Harry P Gillis. These collaborations have contributed to the development of innovative solutions in plasma technology.

Conclusion

Dmitri A Choutov is a key figure in the advancement of plasma technology, with a focus on low-energy electron enhanced etching. His patents and career achievements reflect his dedication to innovation in this specialized field.