Georgia Tech Research Corporation

Leybold Systems Gmbh

Dmitri A Choutov

Kevin P Martin

Harry P Gillis

Jamie Edelkind

Ilya M Vitebskiy

An apparatus for low-damage, anisotropic etching of substrates having the substrate mounted upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to a plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.

Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment

An apparatus for low-damage, anisotropic etching of substrates having the substrate mounted upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.

A method of low-damage, anisotropic etching of substrates including mounting the substrate upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to a plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.

The present invention provides a new method and system for producing a digital optical recording. The process can be divided into two separate operations: mastering of the optical recording on the surface of an elongated member, such as a cylinder, etc., and fast replication of the master record onto the surface of flexible film which is essentially parallel to the surface of the cylinder, etc.

Optical digital media recording and reproduction system

A method of low-damage, anisotropic etching and cleaning of substrates including mounting the substrate upon a mechanical support located within the positive column of a plasma discharge generated by either an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to the positive column, or electrically neutral portion, of a plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.

Method and apparatus for low energy electron enhanced etching and

A method-of low-damage, anisotropic etching of substrates including mounting the substrate upon the anode in a DC plasma reactor and subjecting the substrate to a plasma of low-energy electrons and a species reactive with the substrate. An apparatus for conducting low-damage, anisotropic etching including a DC plasma reactor, a permeable wall hollow cold cathode, an anode, and means for mounting the substrate upon the anode.

Method and apparatus for low energy electron enhanced etching of

The present invention is a system and method for reducing the voltage necessary to produce a glow discharge in a gas. This is done by fabricating the cathode in a gas discharge device out of a conductive material that is permeable to the subject gas rather than out of a solid material, as in the prior art. Fabricating the cathode with a permeable material rather than a solid material increases the surface area of the cathode and provides the gas with greater access to the cathode's surface. Increasing the surface area of the cathode increases the total discharge current which can be extracted from the cathode without increasing the extraction voltage. This allows the gas discharge device to be operated at a lower voltage than is possible using a cathode fabricated of a solid material.

Apparatus and method for reducing operating voltage in gas discharge

A method of low-damage, anisotropic etching of substrates including mounting the substrate upon the anode in a DC plasma reactor and subjecting the substrate to a plasma of low-energy electrons and a species reactive with the substrate. An apparatus for conducting low-damage, anisotropic etching including a DC plasma reactor, a permeable wall hollow cold cathode, an anode, and means for mounting the substrate upon the anode.

Growing community of inventors

Santa Clara, CA, United States of America

Dmitri A Choutov