Location History:
- Hsinchu, TW (1999)
- KaoHsiung, TW (2000)
Company Filing History:
Years Active: 1999-2000
Title: Dinos Huang: Innovator in Semiconductor Technology
Introduction
Dinos Huang is a prominent inventor based in KaoHsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative work focuses on improving dielectric layer processes, which are crucial for the performance of semiconductor devices.
Latest Patents
Dinos Huang's latest patents include a "Process for intermetal SOG/SOP dielectric planarization" and a "Method for using oxygen plasma treatment on a dielectric layer." The first patent describes a process that allows for dielectric planarization without adverse effects. It involves forming a silicon-rich oxide (SRO) layer on a substrate, followed by the deposition of a metal layer and an antireflective coating (ARC) layer. These layers are then etched to define metal patterns. Subsequently, an Ozone-TEOS (O.sub.3 -TEOS) layer and a SOG layer are formed, which are then subjected to etching back treatment to achieve a planar substrate surface. The final step involves depositing a passivation layer over the remaining O.sub.3 -TEOS layer. The second patent outlines a method for depositing a dielectric layer that ensures uniform thickness by using oxygen plasma to eliminate uneven charge distribution on the substrate surface.
Career Highlights
Dinos Huang is currently employed at Mosel Vitelic Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the efficiency and reliability of semiconductor devices, making him a valuable asset to his company.
Collaborations
Dinos has collaborated with notable colleagues, including Tuby Tu and Chin-Ta Wu, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Dinos Huang's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology development.