Beaverton, OR, United States of America

Dinia P Kitendaugh


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2020

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2 patents (USPTO):Explore Patents

Title: Dinia P Kitendaugh: Innovator in Integrated Circuit Testing

Introduction

Dinia P Kitendaugh is a prominent inventor based in Beaverton, Oregon. She has made significant contributions to the field of integrated circuit testing, holding 2 patents that showcase her innovative approach to technology. Her work primarily focuses on enhancing testing systems and processes for integrated circuits.

Latest Patents

One of her latest patents is titled "Converged test platforms and processes for class and system testing of integrated circuits." This invention describes a testing system that utilizes a converged test platform for both structural and system testing of integrated circuit devices. The system includes a DUT socket for testing, along with reprogrammable electronic components that allow for flexibility and faster throughput in testing processes.

Another notable patent is the "Mechanism for facilitating a dynamic electro-mechanical interconnect having a cavity for embedding electrical components and isolating electrical paths." This invention provides a method for separating conductors within an interconnect, ensuring that electrical paths are isolated effectively.

Career Highlights

Dinia is currently employed at Intel Corporation, where she continues to push the boundaries of technology in her field. Her work at Intel has allowed her to collaborate with other talented professionals, contributing to advancements in integrated circuit testing.

Collaborations

Some of her notable coworkers include Evan M Fledell and Abram M Detofsky. Their collaborative efforts have further enhanced the innovative projects they work on together.

Conclusion

Dinia P Kitendaugh is a trailblazer in the realm of integrated circuit testing, with her patents reflecting her commitment to innovation and excellence. Her contributions to the field are invaluable, and her work continues to influence the future of technology.

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