Fremont, CA, United States of America

Dimitri Klyachko

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dimitri Klyachko. Retrieved from https://idiyas.com/inventor/dimitri-klyachko-0o5g3nvn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Dimitri Klyachko in Semiconductor Manufacturing

Introduction

Dimitri Klyachko is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to optical sensors.

Latest Patents

Dimitri holds a patent for "Optical sensors for measuring properties of consumable parts in a semiconductor plasma processing chamber." This invention outlines a method of manufacturing semiconductor devices that involves transferring semiconductor wafers between a substrate handling module and a processing chamber. The processing chamber includes at least one consumable component, and the method allows for detecting an optical signal from this component during times when the chamber is not actively processing the wafers. This innovation enhances the efficiency and reliability of semiconductor manufacturing processes.

Career Highlights

Dimitri Klyachko is currently associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on improving manufacturing techniques and ensuring the quality of semiconductor devices through advanced optical sensing technologies.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Dimitri Klyachko's contributions to semiconductor manufacturing through his innovative patent demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to impact the efficiency of semiconductor processes significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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