West Hills, CA, United States of America

Dhirubhai Patel

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Litton Systems, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dhirubhai Patel. Retrieved from https://idiyas.com/inventor/dhirubhai-patel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Dhirubhai Patel: Innovator in Coating Technology

Introduction

Dhirubhai Patel is a notable inventor based in West Hills, California. He has made significant contributions to the field of coating technology, particularly through his innovative patent that addresses coating uniformity.

Latest Patents

Dhirubhai Patel holds a patent for a "Method of shaping a flux mask and process of sputtering with the shaped flux mask." This invention provides a method for shaping a mask to reduce coating non-uniformity in the radial direction. The process involves a test run of the ion beam sputtering system that coats a stationary glass plate, allowing for precise measurement of coating thickness across the surface. The desired width of the mask is adjusted to achieve a uniform coating rate, ensuring consistency across the entire segment.

Career Highlights

Dhirubhai Patel is associated with Litton Systems, Inc., where he has applied his expertise in coating technologies. His work has contributed to advancements in the manufacturing processes utilized in various industries.

Collaborations

Throughout his career, Dhirubhai has collaborated with notable colleagues, including William P. Debley and Leo K. Lam. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Dhirubhai Patel's contributions to coating technology through his patent demonstrate his commitment to innovation and excellence. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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