The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
Oct. 11, 2000
William Debley, Northridge, CA (US);
Leo Lam, Calabasas, CA (US);
Radhakrishna Mandyam, Agoura Hills, CA (US);
Dhirubhai Patel, West Hills, CA (US);
Litton Systems Inc., Woodland Hills, CA (US);
Abstract
The present invention provides a method for shaping a mask to reduce coating non-uniformity in the radial direction. A test run of the ion beam sputtering system coats a stationary glass plate having the same area and shape as the platen. The resulting coating thickness is measured across the surface of the glass plate and plotted as a function of position. This is the plot of the flux distribution. The coating rate pattern is determined by coating thickness by coating time. The desired width of the mask, which takes the form of a segment of a radial band is adjusted to obtain the desired average coating rate for the entire segment, masked and unmasked. This is repeated for each radial band. All these radial widths put together design the functional form of the mask, the use of which provides a uniform coating of the platen in a radial direction.