Derryl J Allman

Title: The Innovative Contributions of Derryl J Allman

Introduction

Derryl J Allman is a notable inventor based in Camas, WA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents is a method of forming a low k polymer E-beam printable mechanical support. This innovative approach strengthens a low-k interconnect dielectric layer by creating pillars of hardened material within the low-k film. An E-beam source is utilized to expose specific pillar locations, converting the low-k film in those areas to pillars with greater hardness and strength than the surrounding material. Another significant patent involves a semiconductor chip with borderless contact that avoids well leakage. This inventive design features shallow trenches containing field oxide on a substrate, with at least one semiconductor device formed between these trenches. The design includes an oxide layer over the semiconductor device and field oxide, along with an etch stop layer and an inter layer dielectric layer. A contact hole is etched through these layers and filled with a conductive material, enhancing the chip's performance.

Career Highlights

Derryl J Allman is currently associated with LSI Logic Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Throughout his career, Derryl has collaborated with notable colleagues such as Peter McGrath and Shiqun Gu. These collaborations have contributed to the development of groundbreaking technologies in the semiconductor industry.

Conclusion

Derryl J Allman's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.