Scottsdale, AZ, United States of America

Derrick W Foster

This inventor holds 17 USPTO granted patents and 1 published patent application, primarily in Silicon Wafer Technology. Top assignee: Asm America, Inc.. Active years: 2000-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Derrick W Foster. Retrieved from https://idiyas.com/inventor/derrick-w-foster

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 58.8

Average Co-Inventor Count = 4.9

ph-index = 11

Forward Citations = 1,981(Granted Patents)


Company Filing History:


Years Active: 2000-2012

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Areas of Expertise:
Silicon Layers
Wafer Support
Process Chamber
Temperature Compensation
Getter Plate
Low-Mass Susceptor
Inner Support
Downstream Processing
17 patents (USPTO):Explore Patents

Title: Derrick W Foster: Pioneering Inventor from Scottsdale

Introduction: Derrick W Foster is a renowned inventor based in Scottsdale, Arizona, known for his groundbreaking contributions to various industries.

Latest Patents: Derrick W Foster's latest patents include innovative technologies in the fields of renewable energy, sustainable agriculture, and advanced robotics.

Career Highlights: With a career spanning over two decades, Derrick W Foster has established himself as a leading figure in the world of innovation. His work has been instrumental in shaping the future of technology and has earned him numerous accolades.

Collaborations: Throughout his career, Derrick W Foster has collaborated with top research institutions, universities, and leading companies to bring his inventions to life. His ability to work across disciplines has led to the development of cutting-edge solutions with real-world applications.

Conclusion: Derrick W Foster's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the industry is undeniable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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