Redwood City, CA, United States of America

Derek Coon

This inventor holds 23 USPTO granted patents and 6 published patent applications, primarily in Immersion Lithography. Top assignee: Nikon Corporation. Active years: 2005-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Derek Coon. Retrieved from https://idiyas.com/inventor/derek-coon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 8.7

Average Co-Inventor Count = 2.6

ph-index = 9

Forward Citations = 304(Granted Patents)


Company Filing History:


Years Active: 2005-2017

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Areas of Expertise:
Fluid Control System
Immersion Lithography
Optical Assembly
Vacuum Control
Fluid Recovery
Liquid Diverter
Porous Materials
Gas Outlets
Thermophoretic Protection
Extreme Ultraviolet Lithography
Fluid Flow Control
Liquid Containment
23 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Derek Coon in Lithography Technology

Introduction

Derek Coon, based in Redwood City, California, is a highly accomplished inventor with a remarkable portfolio of 23 patents. His contributions to the field of immersion lithography technology have significantly advanced the efficiency and effectiveness of optical systems used in modern manufacturing processes.

Latest Patents

Coon's latest patents showcase his expertise and innovative thinking. One notable invention is the "Immersion Lithography Fluid Control System Regulating Flow Velocity of Gas Based on Position of Gas Outlets." This apparatus consists of an optical member and a gap filled with an immersion liquid, paired with a fluid control device featuring gas outlets. The unique design allows for controlled gas flow, preventing immersion liquid from escaping into surrounding areas while ensuring precise pressure differences across the gas outlets.

Another pivotal patent is the "Apparatus and Method to Control Vacuum at Porous Material Using Multiple Porous Materials." This technology focuses on confining immersion liquids within an immersion area, enabling the effective recovery of these liquids. The apparatus includes an aperture for image projection and utilizes a dual-chamber system with a porous member that enhances liquid recovery efficiency, showcasing Coon's commitment to practical innovations in lithography systems.

Career Highlights

Derek Coon's career is marked by his impressive role at Nikon Corporation, where he has contributed to the development of cutting-edge lithography technologies. His work emphasizes not only innovation but also the integration of advanced materials to improve production capabilities in the semiconductor industry. His extensive patent portfolio highlights his knowledge and foresight in a competitive technological landscape.

Collaborations

Throughout his career, Coon has worked alongside talented colleagues like Alex Ka Tim Poon and Leonard Wai Fung Kho. These collaborations reflect the collaborative spirit prevalent in innovative environments, enabling the team to address complex challenges in lithography and contribute to significant advancements.

Conclusion

Derek Coon exemplifies the qualities of an inventive mind, consistently pushing the boundaries of technology in the field of immersion lithography. His patented inventions not only enhance existing technologies but also pave the way for future advancements in semiconductor manufacturing. Coon’s ongoing contributions continue to inspire and shape the landscape of optical engineering, reinforcing his reputation as a leading inventor in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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