The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Feb. 20, 2009
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Derek Coon, Redwood City, CA (US);
Gaurav Keswani, Fremont, CA (US);
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Derek Coon, Redwood City, CA (US);
Gaurav Keswani, Fremont, CA (US);
Nikon Corporation, Tokyo, JP;
Abstract
An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.