Dennis Schey

Title: Dennis Schey - Innovator in Chemical Mechanical Polishing

Introduction

Dennis Schey is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of chemical mechanical polishing (CMP), particularly in the development of innovative systems that enhance the manufacturing process of semiconductor devices.

Latest Patents

Dennis Schey holds a patent for a multi-step chemical mechanical polishing system. This system is designed to polish a wafer to form metal interconnects in a dielectric layer, upon which barrier and metal layers have been formed. The first polish removes an upper portion of the metal layer using a specific slurry and set of polishing parameters, leaving residual metal within the dielectric layer to serve as the metal interconnects. The second polish, performed on the same platen and polishing pad, removes portions of the barrier layer using a different slurry and set of parameters. This innovative approach reduces dishing and dielectric erosion, ensuring a more efficient and effective polishing process.

Career Highlights

Dennis Schey is currently associated with Speedfam-Ipec Corporation, where he continues to advance the field of CMP technology. His work has been instrumental in improving the quality and efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Dennis has collaborated with talented professionals such as Karey Holland and Ajoy Zutshi. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Dennis Schey is a prominent figure in the field of chemical mechanical polishing, with a patent that showcases his innovative approach to semiconductor manufacturing. His contributions continue to influence the industry and pave the way for future advancements.