Nazareth, PA, United States of America

Dennis Nemeth

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2003-2021

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6 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Dennis Nemeth

Introduction: Dennis Nemeth, an accomplished inventor based in Nazareth, Pennsylvania, has made significant contributions to the field of semiconductor processing. With a strong portfolio of six patents, his work focuses on optimizing etching solutions to enhance the efficiency and consistency of semiconductor device treatments.

Latest Patents: Among his notable inventions is the patent titled "Correlation between conductivity and pH measurements for KOH texturing solutions and additives." This innovation addresses the variability of etchant concentration in immersion processes. By continuously measuring the conductivity of an etchant solution and comparing it against predetermined thresholds, the etchant concentration can be maintained effectively through a feed and bleed process. This method correlates conductivity measurements with premeasured pH values, leading to improved consistency in the treatment of semiconductor devices.

Career Highlights: Throughout his career, Dennis has worked with leading companies in the semiconductor industry, including Akrion and Naura Akrion, Inc. His expertise in semiconductor processing has positioned him as a key player in developing advanced etching solutions that significantly enhance production quality.

Collaborations: Dennis Nemeth has collaborated with esteemed colleagues such as Ismail Kashkoush and Gim-Syang Chen. These partnerships have been pivotal in advancing research and development projects that focus on innovative solutions for the semiconductor industry.

Conclusion: Dennis Nemeth stands out as a notable inventor whose work has a profound impact on semiconductor processing. His innovative approach to etchant solutions demonstrates his commitment to advancing technology. As he continues to develop patents that push boundaries in the industry, Dennis's contributions will undoubtedly shape future advancements in semiconductor manufacturing.

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