The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Dec. 31, 2018
Applicant:
Naura Akrion, Inc., Allentown, PA (US);
Inventors:
Ismail Kashkoush, Orefield, PA (US);
Jennifer Rieker, Whitehall, PA (US);
Gim-Syang Chen, Allentown, PA (US);
Dennis Nemeth, Nazareth, PA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 31/0236 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); H01L 21/67075 (2013.01); H01L 21/67086 (2013.01); H01L 21/67253 (2013.01); H01L 22/10 (2013.01); H01L 22/26 (2013.01); H01L 31/02363 (2013.01); Y02E 10/50 (2013.01);
Abstract
The variability of an etchant concentration in an immersion processes for treatment of semiconductor devices can be significantly lowered by continuously measuring the conductivity of an etchant solution and comparing against predetermined thresholds. The etchant concentration can be maintained by a feed and bleed process based on conductivity measurements of the etchant solution and the conductivity measurements being correlated with premeasured pH values of an etchant solution.