Louvain-la-Neuve, Belgium

Denis Vanderstraeten

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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2 patents (USPTO):Explore Patents

Title: Innovations by Denis Vanderstraeten

Introduction

Denis Vanderstraeten is a notable inventor based in Louvain-la-Neuve, Belgium. He has made significant contributions to the field of non-contact probe technology, holding two patents that showcase his innovative approach to calibration and qualification methods.

Latest Patents

His latest patents include a "Method for the automatic simultaneous synchronization, calibration and qualification of a non-contact probe." This invention relates to an improved method for the simultaneous calibration and qualification of a non-contact probe on a localizer using a single artifact. In this method, non-contact probe readings and localizer readings are synchronized using parameters determined simultaneously with calibration and qualification. The invention also encompasses a non-contact probe and other devices, along with a computer program for performing the invention. Another patent is titled "Method for the automatic calibration-only, or calibration and qualification simultaneously of a non-contact probe." This invention focuses on a method for calibrating a non-contact probe on a localizer, which also allows for simultaneous calibration and qualification without requiring user intervention, utilizing a single artifact.

Career Highlights

Denis Vanderstraeten is associated with Metris N.V., a company known for its advancements in measurement and inspection technologies. His work has significantly impacted the efficiency and accuracy of non-contact probing techniques.

Collaborations

He has collaborated with notable colleagues such as Lieven De Jonge and Bart Van Coppenolle, contributing to the innovative environment at Metris N.V.

Conclusion

Denis Vanderstraeten's contributions to non-contact probe technology through his patents reflect his commitment to innovation and excellence in engineering. His work continues to influence the field and enhance measurement techniques.

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