This inventor holds 7 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignees: Imec Vzw, Katholieke Universiteit Leuven, Other. Active years: 2003-2011.
Location History:
- Heverlee, BE (2003)
- Leuven, BE (2003 - 2011)
Company Filing History:
6 out of 1,860 
1 out of 631 
1 out of 834,453 Years Active: 2003-2011
Title: Denis Shamiryan: Innovator in Plasma Technology
Introduction
Denis Shamiryan is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of plasma technology, holding a total of 7 patents. His innovative approaches have led to advancements in cleaning processes and epitaxial growth methods.
Latest Patents
One of his latest patents is focused on the cleaning of plasma chamber walls using a noble gas cleaning step. This improved reaction chamber cleaning process effectively removes water residues by utilizing noble-gas plasma reactions. The method is easily applicable and can be combined with standard cleaning procedures. It employs a noble-gas plasma, such as helium, which emits high-energy extreme ultraviolet (EUV) photons capable of destructing water molecules to form electronically excited oxygen atoms, thereby facilitating the removal of adsorbed water.
Another significant patent involves a method for selective epitaxial growth of source/drain areas. This method includes providing a substrate with distinct areas, one of which contains at least one gate stack. The process involves applying a poly-silicon or poly-silicon germanium top layer on the substrate, which can be etched using the same chemistry as the substrate. The method allows for the selective removal of the top layer from the first area while simultaneously removing it from the second area, enabling selective epitaxial growth of source/drain areas in the first area.
Career Highlights
Denis Shamiryan has worked with prominent organizations such as Imec and the Interuniversitair Microelektronica Centrum (imec). His work in these institutions has been pivotal in advancing research and development in microelectronics and plasma technologies.
Collaborations
Throughout his career, Denis has collaborated with esteemed colleagues, including Marc Demand and Vasile Paraschiv. These collaborations have further enriched his research and innovation efforts.
Conclusion
Denis Shamiryan's contributions to plasma technology and microelectronics are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the field. His work continues to influence the industry and inspire future innovations.