The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Sep. 05, 2008
Adam Michal Urbanowicz, Wroclaw, PL;
Mikhaïl Baklanov, Veltem-Beisem, BE;
Denis Shamiryan, Leuven, BE;
Stefan DE Gendt, Wijnegem, BE;
Adam Michal Urbanowicz, Wroclaw, PL;
Mikhaïl Baklanov, Veltem-Beisem, BE;
Denis Shamiryan, Leuven, BE;
Stefan De Gendt, Wijnegem, BE;
IMEC, Leuven, BE;
Katholieke Universiteit Leuven K.U. Leuven R&D, Leuven, BE;
Abstract
An improved reaction chamber cleaning process is provided for removing water residues that makes use of noble-gas plasma reactions. The method is easy applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules to form electronically excited oxygen atoms is used to remove the adsorbed water.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile