This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Debkalpo Das: Innovator in Predictive Metrology
Introduction
Debkalpo Das is a notable inventor based in Tamil Nadu, India. He has made significant contributions to the field of predictive metrology, particularly in the context of film deposition processes. His innovative approach has led to the development of a unique patent that enhances the accuracy of film thickness predictions.
Latest Patents
Debkalpo Das holds a patent titled "Systems and methods for predicting film thickness using virtual metrology." This method involves obtaining sensor data associated with a deposition process performed in a process chamber to deposit film on a substrate's surface. The process includes generating a variety of physics-based outputs using a transformation function and the sensor data. Furthermore, it maps these outputs to a training set and trains a virtual model based on the training set and sensor data. The virtual model is designed to generate predictive metrology data associated with the film, showcasing a significant advancement in the field.
Career Highlights
Debkalpo Das is currently employed at Applied Materials, Inc., a leading company in the materials engineering sector. His work focuses on enhancing the precision of manufacturing processes through innovative technologies. His expertise in virtual metrology has positioned him as a key player in the industry.
Collaborations
Some of his notable coworkers include Ramachandran Subramanian and Raman K Nurani. Their collaborative efforts contribute to the advancement of technologies in the field of materials engineering.
Conclusion
Debkalpo Das is a distinguished inventor whose work in predictive metrology has the potential to revolutionize film deposition processes. His contributions reflect a commitment to innovation and excellence in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
