David Wolze

Title: Innovations of David Wolze

Introduction

David Wolze is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is titled "Particle detection on a patterned or bare wafer surface." This invention presents a method and apparatus for predicting the number of contaminant particles in the circuit area of a patterned semiconductor wafer. The method involves forming a grating test pattern on the wafer and scanning it with a light beam to detect variations in the diffraction pattern caused by contaminant particles. This allows for real-time inspection of patterned wafers, enhancing the reliability of semiconductor manufacturing.

Another notable patent is the "Photoemission contaminant detector." This invention provides methods for determining the presence and thickness of a contaminant layer on the surface of electrically conductive materials. By utilizing changes in photoemission current from illuminated spots on the surface, the invention effectively identifies contaminant layers while compensating for capacitive and photovoltaic currents.

Career Highlights

David Wolze is currently employed at Tencor Instruments, a company known for its advanced semiconductor inspection and metrology equipment. His work at Tencor Instruments has allowed him to apply his innovative ideas to practical applications in the semiconductor industry.

Collaborations

Throughout his career, David has collaborated with notable colleagues such as Armand P Neukermans and Stanley E Stokowski. These collaborations have contributed to the advancement of technology in the field.

Conclusion

David Wolze's contributions to semiconductor technology through his patents demonstrate his commitment to innovation and excellence. His work continues to impact the industry positively, paving the way for future advancements.