David Wesley Manley

Title: David Wesley Manley: Innovator in Semiconductor Photolithography

Introduction

David Wesley Manley is a notable inventor based in San Diego, California. He has made significant contributions to the field of semiconductor photolithography, particularly in the maintenance of light sources used in this technology. His innovative approach has the potential to enhance the reliability and efficiency of photolithography systems.

Latest Patents

David Wesley Manley holds a patent for the "Maintenance of modules for light sources used in semiconductor photolithography." This patent describes systems for maintaining light sources where a module is evaluated at various pulse counts. The evaluation produces a binary prediction regarding the module's likelihood of operating without failure in subsequent pulse sequences. A machine learning model, trained on metrics from measurements taken on deinstalled modules, facilitates this prediction. Users can select from a group of models, each trained differently, based on their maintenance objectives.

Career Highlights

David is currently employed at Cymer, Inc., a company known for its advancements in photolithography technology. His work at Cymer has positioned him as a key player in the development of innovative solutions for the semiconductor industry.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Russell Allen Burdt and Kumar Raja Guvindan Raju. These collaborations have contributed to the advancement of technology in their field.

Conclusion

David Wesley Manley is a distinguished inventor whose work in semiconductor photolithography has made a significant impact. His innovative patent demonstrates the integration of machine learning in predicting the reliability of light source modules, showcasing his commitment to advancing technology in this critical area.